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【簡介】 A thoroughly updated third edition of an classic and widely adopted text, perfect for practical transistor design and in the classroom. Covering a variety of recent developments, the internationally renowned authors discuss in detail the basic properties and designs of modern VLSI devices, as well as factors affecting performance. Containing around 25% new material, coverage has been expanded to include high-k gate dielectrics, metal gate technology, strained silicon mobility, non-GCA (Gradual Channel Approximation) modelling of MOSFETs, short-channel FinFETS, and symmetric lateral bipolar transistors on SOI. Chapters have been reorganized to integrate the appendices into the main text to enable a smoother learning experience, and numerous additional end-of-chapter homework exercises (+30%) are included to engage students with real-world problems and test their understanding. A perfect text for senior undergraduate and graduate students taking advanced semiconductor devices courses, and for practicing silicon device professionals in the semiconductor industry.
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Fundamentals of Modern Manufacturing SI 7/e +作者:Groover +年份:2021 年7 版 +ISBN:9781119706427 +書號:ME0429P +規格:平裝/單色 +頁數:1008 +出版商:John Wiley ●Revised and expanded coverage of topics- Hardness, Tolerances, Measurement of Surfaces, Casting Technology, Powder Metallurgy, Rolling, Forging, Extrusion, Additive Manufacturing, , Machining Economics, and more ●Sections on topics including Plastic Extrusion and Injection Molding Processes, Equipment, and Economics of Sheet-Metal Pressworking, Micro and Nano Composites, Forming Limit Diagram, Hybrid Machining Systems, DFMA Guide , Protocols used in Integrated manufacturing, Agile Production and others ●Historical notes on integrated circuit technology, measurement systems, polymers, natural and synthetic rubbers, machine tool technology, and many others ●New and updated examples and practice problems in all chapters in SI units ●Completely updated as SI version ●New and updated references, illustrations, and tables of thermal and volumetric properties of common engineering materials. 目錄 1 INTRODUCTION AND OVERVIEW OF MANUFACTURING Part I Materials Properties and Product Attributes 2 THE NATURE OF MATERIALS 3 MECHANICAL PROPERTIES OF MATERIALS 4 PHYSICAL PROPERTIES OF MATERIALS 5 ENGINEERING MATERIALS 6 DIMENSIONS, SURFACES, AND THEIR MEASUREMENT Part II Solidification Processes 7 FUNDAMENTALS OF METAL CASTING 8 METAL CASTING PROCESSES 9 GLASSWORKING 10 SHAPING PROCESSES FOR PLASTICS 11 PROCESSING OF POLYMER MATRIX COMPOSITES AND RUBBER Part III Particulate Processing of Metals and Ceramics 12 POWDER METALLURGY 13 PROCESSING OF CERAMICS AND CERMETS Part IV Metal Forming and Sheet Metalworking 14 FUNDAMENTALS OF METAL FORMING 15 BULK DEFORMATION PROCESSES IN METAL WORKING 16 SHEET METALWORKING Part V Material Removal Processes 17 THEORY OF METAL MACHINING 18 MACHINING OPERATIONS AND MACHINE TOOLS 19 CUTTING-TOOL TECHNOLOGY 20 ECONOMIC AND PRODUCT DESIGN CONSIDERATIONS IN MACHINING 21 GRINDING AND OTHER ABRASIVE PROCESSES 22 NONTRADITIONAL MACHINING AND THERMAL CUTTING PROCESSES Part VI Property Enhancing and Surface Processing Operations 23 HEAT TREATMENT OF METALS 24 SURFACE PROCESSING OPERATIONS Part VII Joining and Assembly Processes 25 FUNDAMENTALS OF WELDING AND WELDING PROCESSES 26 BRAZING, SOLDERING, AND ADHESIVE BONDING 27 MECHANICAL ASSEMBLY Part VIII Special Processing and Assembly Technologies 28 ADDITIVE MANUFACTURING 29 PROCESSING OF INTEGRATED CIRCUITS 30 ELECTRONICS ASSEMBLY AND PACKAGING 31 MICROFABRICATION TECHNOLOGIES 32 NANOFABRICATION TECHNOLOGIES Part IX Manufacturing Systems 33 AUTOMATION TECHNOLOGIES FOR MANUFACTURING SYSTEMS 34 INTEGRATED MANUFACTURING SYSTEMS Part X Manufacturing Support Systems 35 PROCESS PLANNING AND PRODUCTION CONTROL 36 QUALITY CONTROL AND INSPECTION
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【原文書】 書名:Fundamentals of Modern VLSI Devices 2/E(IE) 2009 作者:Yuan Taur、Tak H. Ning 出版社:Cambridge 書號:0816-1 ISBN碼:9780521180245 目錄 1. Introduction 2. Basic Device Physics 3. MOSFET Devices 4. CMOS Device Design 5. CMOS Performance Factors 6. Bipoloar Devices 7. Bipolar Device Design 8. Bipolar Performance Factors 9. Memory Devices 10. Silicon-on-Insulator Devices P.656
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